Micron: Highly sensitive photoresist for 90nm process technology

2025: Highly Sensitive Photoresister Testing

Micron tests a highly sensitive photoresist of domestic production for 90 nm process technology. The company announced this on February 26, 2025.

In the technical processes of Micron, 43 ultra-pure chemical materials and 39 special electronic gases and mixtures are used, active work is underway to replace all components with domestic analogues in order to ensure technological sovereignty.

The release of domestic materials for microelectronics paves the way for ending the monopoly of foreign players. It is important to conduct import substitution work in cooperation with scientific institutions - then research immediately goes into production, - said Gulnara Khasyanova, General Director of Micron JSC. - Domestic photoresist for 90 nm is an important milestone in import substitution of materials and the development of microelectronics production.

As of February 2025, more than 16 Russian manufacturers and scientific institutes are participating in the Micron import substitution program. Domestic photoresist is produced at the enterprise of the Volga Federal District, the center of the chemical industry, which provides more than 40% of the total production of Russian chemical materials.

Photoresist is a photosensitive polymer material for photolithography, which is used in the key process of manufacturing integrated circuits in order to obtain "windows" on the surface of the treated material for the access of etching substances. Strict compliance of the material with the necessary technical requirements and standards of microelectronic production ensures accurate formation of elements on the plate.