NIITM (Research Institute of Precision Engineering)

History

Start of Design Center

In the main office of the Research Institute of Precision Engineering (NIITM, part of the Element Group of Companies) in Zelenograd, a new Design Center with an area of ​ ​ 1520 square meters. m. Its creation aims to accelerate the full cycle of equipment development - from idea and engineering calculations to the creation of working design documentation. About this GC "Element" reported on March 2, 2026.

By combining specialized specialists in one space, interaction between teams will become more efficient, and the timing of projects will be reduced.

The Center has seven key units of the institute. Engineers, designers, programmers and other specialists interact directly. As of March 2026, more than 100 employees work here, including specialists from new areas of equipment development: robotic systems and ion implantation. At the same time, the project of the Center takes into account the future growth of the company - it includes the opportunity to accommodate even more employees, which corresponds to the strategy for developing the personnel potential of the enterprise.

The space is designed at the expense of NIITM's own funds and taking into account the requirements for working areas: it combines separate offices, open office areas (open space) and meeting rooms of different sizes. Large-scale modernization affected not only the interior: the facade glazing was updated and all engineering communications were completely replaced.

The main task of the created Center is to solve complex scientific and production problems related to the design and development of equipment, components and components; software creation; testing and testing of installations, - said Mikhail Biryukov, Director General of NIITM.

2025: Announcement of a plant for plasma chemical deposition on 300 mm silicon wafers

The first Russian installation for plasma chemical deposition on 300-mm silicon plates was presented in March 2025. The development was carried out by the Research Institute of Precision Engineering (NIITM), which is part of the Element Group of Companies. Before the advent of this equipment, there were no analogues on the Russian market for working with plates of this diameter, and the entire production base was focused on imported solutions or installations designed for 200-mm substrates.

According to Izvestia, plates with a diameter of 300 mm are today the world standard, which produces more than 90% of microcircuits. This size significantly increases the number of chips produced on a single substrate, which ultimately reduces their cost to the consumer.

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Фото: Freepik

The head of the advanced development department of NIITM Georgy Yeritsyan emphasized that the new complex is designed to process silicon wafers with a diameter of 300 mm, but has the ability to change the configuration for working with 200 mm wafers. This ensures a smooth transition of production from existing technological processes to new standards.

One of the key achievements of NIITM specialists was the localization of production of a significant number of components of equipment in a short time. At the same time, the developed basic technological processes are not inferior to imported analogues. Georgy Yeritsyan noted that the creation of a line of domestic industrial installations adapted to the 300-mm format will strengthen the country's technological sovereignty and its position in the world market.

Development of the plant began at the end of 2021. During this time, engineering scientists manufactured a prototype cluster structure consisting of four different technological modules combined by a common robotic transport system to move the plates.^[1]

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